Monitoring of semiconductor manufacturing process
and cleanroom environment Monitoring of emission gas of semiconductor fab Monitoring of photomask and photoresist process and environment Monitoring of display manufacturing process and environment Measurement of environmental hormone substances
Distinct detection of F and Cl Organic acid detectable Low temperature water soluble process gas detectable Fast and stable monitoring Automatic solution supply system Highly sensitive, accurate monitoring Extensive detection range Continuous cleaning of sample tubes Convenient operation and management through remote control
Monitoring Ion
F-, Cl-, NO2-, Br-, NO3-, and SO42-
Detection Range
0.1~100 ppbv
Limit of Detection
0.10 ppbv for all ions
Sensitivity
0.05 ppbv
Operational Condition
5~40¡É, 0~70%
Precision
¡¾3% (F.S)
Detection Time
20 minutes / sample
Sampling Ports
12 (or 24) ports
Communication
RS-232C , TCP/IP
Size
Main Body: 955(W)¡¿615(D)¡¿1729(H)
TCU : 550(W)¡¿613(D)¡¿1280(H)
Monitoring of semiconductor manufacturing process
and cleanroom environment 
Monitoring Ion
